Introduction to microlithography : theory, materials, and processing / Larry F. Thompson, editor, C. Grant Willson, editor, Murrae J.S. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.

Format:

Book

Contributor:

Thompson, L. F., 1944-

Willson, C. G. (C. Grant), 1939-

Bowden, M. J., 1943-

American Chemical Society. Division of Organic Coatings and Plastics Chemistry.

American Chemical Society. Meeting 1983 : Seattle, Wash.)

Series:

ACS symposium series 0097-6156 ; 219.

ACS symposium series. 0097-6156 ; 219

Language:

English

Subjects (All):

Photolithography--Congresses.

Photolithography.

Photoresists--Congresses.

Photoresists.

Genre:

Conference papers and proceedings.

Physical Description:

ix, 363 pages : illustrations ; 24 cm.

Place of Publication:

Washington, D.C. : The Society, 1983.

Contents:

An introduction to lithography / L.F. Thompson

The lithographic process

the physics / L.F. Thompson and M.J. Bowden

Organic resist materials

theory and chemistry / C. Grant Willson

Resist processing / L.F. Thompson and M.J. Bowden

Plasma etching / J.A. Mucha and D.W. Hess

Multi-layer resist systems / B.J. Lin.

Notes:

Includes bibliographies and index.

ISBN:

0841207755

OCLC:

9371344