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Dry etching for microelectronics / edited by Ronald A. Powell.
LIBRA TK7871.85 .D79 1984
Available from offsite location
- Format:
- Book
- Series:
- Materials processing, theory and practices ; v. 4.
- Materials processing--theory and practices ; v. 4
- Language:
- English
- Subjects (All):
- Semiconductors--Etching.
- Semiconductors.
- Plasma etching.
- Physical Description:
- xi, 299 pages : illustrations ; 24 cm.
- Place of Publication:
- Amsterdam ; New York : North-Holland Physics Pub. ; New York, N.Y. : Distributors for the USA and Canada, Elsevier Science Pub. Co., 1984.
- Notes:
- Includes index.
- Bibliography: pages 223-294.
- ISBN:
- 0444869050
- OCLC:
- 10913832
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