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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
LIBRA TK7874 .E4818 1994
Available from offsite location
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2194.
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 2194
- Language:
- English
- Subjects (All):
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- X-ray lithography--Congresses.
- X-ray lithography.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Semiconductors--Etching--Congresses.
- Semiconductors.
- Semiconductors--Etching.
- Masks (Electronics)--Congresses.
- Masks (Electronics).
- Genre:
- Conference papers and proceedings.
- Physical Description:
- vii, 420 pages : illustrations ; 28 cm.
- Place of Publication:
- Bellingham, Wash. : SPIE, [1994]
- Notes:
- Includes bibliographical references and index.
- ISBN:
- 0819414891
- OCLC:
- 30614005
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