An introduction to physics and technology of thin films / Alfred Wagendristel, Yuming Wang.

Format:

Book

Author/Creator:

Wagendristel, Alfred.

Contributor:

Wang, Youming.

Language:

English

Subjects (All):

Thin films.

Thin film devices.

Physical Description:

xi, 147 pages : illustrations ; 23 cm

Place of Publication:

Singapore ; River Edge, NJ : World Scientific, [1994]

Summary:

Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics -- ferromagnetic films, diffusion in thin films and mechanical properties of thin films -- are discussed.Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.

Notes:

Includes bibliographical references (pages 142-143) and index.

ISBN:

9810216165

OCLC:

30399821