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Glow discharge processes : sputtering and plasma etching / Brian Chapman.
LIBRA QC702.7.P6 C48
Available from offsite location
- Format:
- Book
- Author/Creator:
- Chapman, Brian N.
- Language:
- English
- Subjects (All):
- Sputtering (Physics).
- Glow discharges.
- Plasma etching.
- Physical Description:
- xv, 406 pages : illustrations ; 24 cm
- Place of Publication:
- New York : Wiley, 1980.
- Summary:
- Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications - practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
- Notes:
- "A Wiley-Interscience publication."
- Includes index.
- Bibliography: pages 397-400.
- ISBN:
- 047107828X :
- OCLC:
- 6379539
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