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Plasma etching : an introduction / edited by Dennis M. Manos, Daniel L. Flamm.
LIBRA TA2020 .P5 1989
Available from offsite location
- Format:
- Book
- Series:
- Plasma--materials interactions
- Plasma--materials interactions.
- Language:
- English
- Subjects (All):
- Plasma etching.
- Physical Description:
- xii, 476 pages : illustrations ; 24 cm.
- Place of Publication:
- Boston : Academic Press, [1989]
- Summary:
- Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.
- Notes:
- Includes bibliographical references and index.
- ISBN:
- 0124693709
- OCLC:
- 17384997
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